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Patents

Patterned Apertured Nonwoven:

U.S. Patent No. 12,004,933

Author Image

By: Tara Olivo

Associate Editor at Nonwovens Industry, Rodman Media

Sijia Wang, Beijing, China; Fancheng Wang, Beijing, China; Yuhan Wang, Beijing, China; Meng Chen, Beijing, China; and Xiaoxin Liu, Beijing, China.
Assigned to The Procter & Gamble Company, Cincinnati, OH.

Filed: 10/26/21
Issued: 6/11/24

A nonwoven substrate comprising: a) a top surface; b) a bottom surface; and c) a plurality of apertures, each of which extends from the top surface through said nonwoven substrate to the bottom surface, wherein said plurality of apertures define a plurality of discrete non-aperture zones; wherein each of said plurality of discrete non-aperture zones has a periphery formed by a continuous line of apertures, with adjacent apertures being spaced apart by an edge-to-edge distance of no more than 3 mm; wherein each of said plurality of discrete non-aperture zones is substantially free of apertures within the periphery; herein the area ratio of said plurality of discrete non-aperture zones over said nonwoven substrate ranges from 60% to 90%; and wherein some of said plurality of discrete non-aperture zones have an area of 100 mm2 or more, wherein each of said plurality of apertures has a size ranging from 0.2 mm2 to 1.5 mm2, or from 0.4 mm2 to 1.3 mm2, and wherein said plurality of apertures further define one or more aperture zones; wherein each of said one or more aperture zones comprises four or more apertures therein; wherein each aperture within each of said aperture zones has at least three adjacent apertures that are spaced apart from it by an edge-to-edge distance of no more than 3 mm.

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